Specification :

Sputtering Targets Sputtering materials for the applications to magnetic disk and head, magneto optical disk, optical disk, superconducting thin film, protective film. All our product , we are strict with the grain size. All our product, CRM' s target are advance with ultrafine grain size and small second phase.

Such as:

Metal Sputtering Targets or rare earth metal sputtering targets: Al, Ag, Au, La, Ce, Co, C, Cr, Cu, Dy, Er, Eu, Gd, Ho, Hf , In, Ir, Lu, Mg, Mn, Mo, Nb, Nd, Ni, Pr, Pd, Pt, Re, Sc, Si, Sm, Ta, Tb, Ti, Tm, V, W, Yb, Y, Zr ,

Alloy Sputtering Targets: AlAg , AlSi, CeGd, CeSm, CoZr, CoCr, CoNi, CoPt, CoNiCr, CoNiPt, FeCoB, CoTaZr, CoNbZr, CoCrMo, CrV, CrB, CrCu, DyFe, DyFeCo, GaAs , Gd-Fe, GdFeCo, NdDyFeCo, NiFe, NiTi, NiV, TbFe, TbFeCo, TbGdFeCo, TiAl, ZrTi, ZrNi , ZrNb, ZrAl, ZrCu, ZrY

Ceramic Sputtering Targets : Al2O3, Sb2O3, BaF2, Bi2O3, CaF 2, CdS, CeO2, CeF3 , Cr2O3, GaAs , Gd2O3 , HfO2, ITO, Target PbZrO3, LaF3, MgF2, MgO, MoO, Nb2O5, Nd2O3, NdF3, NiO, Pr6O11, SiO, SiO2, SiC, Si3N4, Sm2O3, SrF3, Ta2O5, TiO , TiO2 , Ti2O3, Ti3O5, V2O5, WO3, Y2O3, bF3 , ZnO , ZnSe , ZnS , ZnO: Al, ZrO2

Purity: 99% , 99.9% , 99.95% 99.99% , 99.995% 99.999% and 99.9999% .
Shape: foil, sheet, wire, filament, rod, pipe, tube, powder, pellet, shot, wafer, plate, tablet, ingot, chunk, lump, granule, dendritic, crystal, and base on your drawing.
Dimension: Diameter (